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Training Course on Semiconductor Device Physics and Fabrication
Introduction
Introduction
Training Course on Semiconductor Device Physics and Fabrication offers a deep and structured understanding of the principles, physics, and manufacturing technologies behind modern semiconductor devices. In a world powered by nanoelectronics, integrated circuits, and microfabrication, this course equips participants with essential knowledge of carrier transport, PN junctions, MOSFETs, BJTs, CMOS technologies, and semiconductor materials science. Through a combination of theory, simulation, and real-world case studies, the course covers semiconductor processing steps including oxidation, diffusion, photolithography, etching, doping, and thin-film deposition.
Designed for engineers, researchers, and technologists working in semiconductor R&D, cleanroom fabrication, device modeling, and failure analysis, this course also includes insights into advanced fabrication methods such as FinFETs, SOI, quantum devices, and 2D materials. Participants gain hands-on skills in device simulation using TCAD tools, process integration techniques, yield enhancement, and cleanroom protocols, all essential for building reliable high-performance semiconductor devices.
Programme Curriculum
Training Course on Semiconductor Device Physics and Fabrication
Introduction
Training Course on Semiconductor Device Physics and Fabrication offers a deep and structured understanding of the principles, physics, and manufacturing technologies behind modern semiconductor devices. In a world powered by nanoelectronics, integrated circuits, and microfabrication, this course equips participants with essential knowledge of carrier transport, PN junctions, MOSFETs, BJTs, CMOS technologies, and semiconductor materials science. Through a combination of theory, simulation, and real-world case studies, the course covers semiconductor processing steps including oxidation, diffusion, photolithography, etching, doping, and thin-film deposition.
Designed for engineers, researchers, and technologists working in semiconductor R&D, cleanroom fabrication, device modeling, and failure analysis, this course also includes insights into advanced fabrication methods such as FinFETs, SOI, quantum devices, and 2D materials. Participants gain hands-on skills in device simulation using TCAD tools, process integration techniques, yield enhancement, and cleanroom protocols, all essential for building reliable high-performance semiconductor devices.
Course duration
10 Days
Course Objectives
Understand the fundamentals of semiconductor physics and band theory
Explore charge carrier dynamics, mobility, and recombination mechanisms
Analyze PN junctions, diodes, and their I-V characteristics
Design and evaluate MOSFET and BJT architectures
Examine CMOS process flow and fabrication techniques
Apply photolithography, etching, and doping in device making
Learn oxidation, CVD, PVD, and epitaxy methods for material growth
Model devices using industry-standard TCAD simulation tools
Understand cleanroom classifications, contamination control, and safety
Explore scaling challenges in FinFETs and beyond CMOS technologies
Investigate wide bandgap materials like GaN and SiC
Analyze yield, reliability, and failure mechanisms
Review case studies from advanced node fabrication and 2D electronics
Organizational Benefits
Build in-house capability for semiconductor innovation
Equip R&D teams with fabrication and process integration knowledge
Accelerate new product development in chip design and nanotech
Reduce reliance on external fabrication services
Improve fabrication process efficiency and yield
Train engineers in ISO cleanroom and ESD-compliant operations
Enhance product reliability through device physics understanding
Strengthen failure analysis and quality control expertise
Prepare teams for emerging markets in GaN, SiC, and 2D materials
Increase competitiveness in the global semiconductor ecosystem
Target Participants
Semiconductor Engineers
Device Physicists and Technologists
Process Integration Engineers
Nanotechnology and Microelectronics Researchers
Electrical and Materials Science Students
Cleanroom and Fab Operators
Failure Analysis and QA Teams
Course Outline
Module 1: Introduction to Semiconductor Physics
Band theory and semiconductors vs insulators
Intrinsic and extrinsic materials
Fermi level and carrier concentration
Carrier generation and recombination
Case Study: Silicon vs GaAs properties
Module 2: Charge Transport Mechanisms
Drift and diffusion currents
Mobility and scattering mechanisms
Continuity and Poisson’s equations
High-field effects and carrier saturation
Case Study: Carrier mobility in advanced CMOS
Module 3: PN Junction and Diode Characteristics
Depletion region and built-in potential
Forward and reverse bias behavior
Zener, Schottky, and tunnel diodes
Breakdown mechanisms and capacitance
Case Study: Zener diodes in voltage regulation
Module 4: Bipolar Junction Transistors (BJT)
Structure and operation modes
Ebers-Moll model and charge control
Small signal analysis
BJT fabrication steps
Case Study: BJT vs CMOS in analog ICs
Module 5: MOSFET Device Physics
MOS capacitor fundamentals
Threshold voltage and channel formation
Scaling and short channel effects
Subthreshold conduction and leakage
Case Study: NMOS vs PMOS in logic gates
Module 6: CMOS Technology and Fabrication Flow
CMOS inverter and logic design
Twin-well and LOCOS isolation
Self-aligned gates and silicide processes
Latch-up prevention and layout rules
Case Study: CMOS scaling from 65nm to 5nm
Module 7: Oxidation and Thin Film Deposition
Thermal oxidation and dry/wet growth
CVD (LPCVD, PECVD) and PVD techniques
Epitaxy for single crystal growth
Film thickness control and measurement
Case Study: Gate oxide reliability in MOS
Module 8: Lithography and Patterning
Photolithography process flow
Photoresists, masks, and aligners
Resolution limits and EUV lithography
Etch processes: dry vs wet
Case Study: Patterning at 7nm node
Module 9: Doping and Junction Formation
Ion implantation and diffusion
Annealing and activation
Doping profiles and sheet resistance
SIMS characterization
Case Study: Halo implants in modern transistors
Module 10: Etching and Cleaning Techniques
Reactive Ion Etching (RIE) and DRIE
Isotropic vs anisotropic etching
Post-etch cleaning and damage removal
Selectivity and endpoint detection
Case Study: Via etching in DRAM
Module 11: Process Integration and Yield Engineering
Process control and parameter interactions
Integration of front-end and back-end steps
Yield calculation and enhancement techniques
Design for manufacturability (DFM)
Case Study: Yield loss in sub-20nm technologies
Module 12: Reliability and Failure Mechanisms
Time-Dependent Dielectric Breakdown (TDDB)
Hot Carrier Injection (HCI)
Electromigration and ESD
Burn-in and life testing
Case Study: Failure analysis of FinFET devices
Module 13: Wide Bandgap and Emerging Materials
GaN and SiC properties and applications
2D materials: MoS2, graphene
Thermal management in high-power devices
Defect and dislocation control
Case Study: SiC in EV power modules
Module 14: FinFET and Advanced Transistor Structures
Tri-gate and nanowire transistors
Process flow and challenges
Quantum tunneling and leakage control
Device modeling considerations
Case Study: Intel 14nm FinFET design
Module 15: TCAD Simulation and Process Modeling
Introduction to Synopsys Sentaurus/Silvaco Atlas
Process simulation (oxidation, diffusion)
Device simulation (IV, CV, breakdown)
Calibration and parameter extraction
Case Study: TCAD modeling of a CMOS inverter
Training Methodology
This course employs a participatory and hands-on approach to ensure practical learning, including:
Interactive lectures and presentations.
Group discussions and brainstorming sessions.
Hands-on exercises using real-world datasets.
Role-playing and scenario-based simulations.
Analysis of case studies to bridge theory and practice.
Peer-to-peer learning and networking.
Expert-led Q&A sessions.
Continuous feedback and personalized guidance.
Register as a group from 3 participants for a Discount
Upon successful completion of this training, participants will be issued with a globally- recognized certificate.
Tailor-Made Course
We also offer tailor-made courses based on your needs.
Key Notes
a. The participant must be conversant with English.
b. Upon completion of training the participant will be issued with an Authorized Training Certificate
c. Course duration is flexible and the contents can be modified to fit any number of days.
d. The course fee includes facilitation training materials, 2 coffee breaks, buffet lunch and A Certificate upon successful completion of Training.
e. One-year post-training support Consultation and Coaching provided after the course.
f. Payment should be done at least a week before commence of the training, to FINESKILL TRAINING CENTER account, as indicated in the invoice so as to enable us prepare better for you.